APA (7th ed.) Citation

Moon, B. K., Hironaka, K., & Isobe, C. (2001). Fabrication of ferroelectric SrBi2Ta2O9 capacitor films using plasma-assisted metalorganic chemical vapor deposition and their electrical properties. Journal of Applied Physics, 89(11), 6370. https://doi.org/10.1063/1.1353564

Chicago Style (17th ed.) Citation

Moon, B. K., K. Hironaka, and C. Isobe. "Fabrication of Ferroelectric SrBi2Ta2O9 Capacitor Films Using Plasma-assisted Metalorganic Chemical Vapor Deposition and Their Electrical Properties." Journal of Applied Physics 89, no. 11 (2001): 6370. https://doi.org/10.1063/1.1353564.

MLA (9th ed.) Citation

Moon, B. K., et al. "Fabrication of Ferroelectric SrBi2Ta2O9 Capacitor Films Using Plasma-assisted Metalorganic Chemical Vapor Deposition and Their Electrical Properties." Journal of Applied Physics, vol. 89, no. 11, 2001, p. 6370, https://doi.org/10.1063/1.1353564.