The formation of shallow low-resistance source-drain regions for VLSI CMOS technologies.
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| Title: | The formation of shallow low-resistance source-drain regions for VLSI CMOS technologies. |
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| Authors: | Butler, Alan L., Foster, D. J. |
| Source: | IEEE Journal of Solid-State Circuits; February 1985, Vol. 20, p70-75, 6p |
| Database: | Applied Science & Technology Source |
| ISSN: | 00189200 |
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| DOI: | 10.1109/JSSC.1985.1052278 |
