Intrinsic stress in chemical vapor deposited diamond films: an analytical model for the plastic deformation of the Si substrate.

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Bibliographic Details
Title: Intrinsic stress in chemical vapor deposited diamond films: an analytical model for the plastic deformation of the Si substrate.
Authors: Jeong, J.-h, Kwon, D., Lee, W.-S.
Source: Journal of Applied Physics; August 1 2001, Vol. 90 Issue 3, p1227-1236, 10p
Database: Applied Science & Technology Source
Description
ISSN:00218979
DOI:10.1063/1.1383263