APA (7th ed.) Citation

Jeong, J., Kwon, D., & Lee, W. (2001). Intrinsic stress in chemical vapor deposited diamond films: An analytical model for the plastic deformation of the Si substrate. Journal of Applied Physics, 90(3), 1227. https://doi.org/10.1063/1.1383263

Chicago Style (17th ed.) Citation

Jeong, J.-h, D. Kwon, and W.-S Lee. "Intrinsic Stress in Chemical Vapor Deposited Diamond Films: An Analytical Model for the Plastic Deformation of the Si Substrate." Journal of Applied Physics 90, no. 3 (2001): 1227. https://doi.org/10.1063/1.1383263.

MLA (9th ed.) Citation

Jeong, J.-h, et al. "Intrinsic Stress in Chemical Vapor Deposited Diamond Films: An Analytical Model for the Plastic Deformation of the Si Substrate." Journal of Applied Physics, vol. 90, no. 3, 2001, p. 1227, https://doi.org/10.1063/1.1383263.