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Intrinsic stress in chemical vapor deposited diamond films: an analytical model for the plastic deformation of the Si substrate.

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Bibliographic Details
Title: Intrinsic stress in chemical vapor deposited diamond films: an analytical model for the plastic deformation of the Si substrate.
Authors: Jeong, J.-h, Kwon, D., Lee, W.-S.
Source: Journal of Applied Physics; August 1 2001, Vol. 90 Issue 3, p1227-1236, 10p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 500781147
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Intrinsic stress in chemical vapor deposited diamond films: an analytical model for the plastic deformation of the Si substrate.
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  Data: <searchLink fieldCode="AU" term="%22Jeong%2C+J%2E-h%22">Jeong, J.-h</searchLink><br /><searchLink fieldCode="AU" term="%22Kwon%2C+D%2E%22">Kwon, D.</searchLink><br /><searchLink fieldCode="AU" term="%22Lee%2C+W%2E-S%2E%22">Lee, W.-S.</searchLink>
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+Applied+Physics%22">Journal of Applied Physics</searchLink>; August 1 2001, Vol. 90 Issue 3, p1227-1236, 10p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=500781147
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      – Type: doi
        Value: 10.1063/1.1383263
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      – Code: eng
        Text: English
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        PageCount: 10
        StartPage: 1227
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      – TitleFull: Intrinsic stress in chemical vapor deposited diamond films: an analytical model for the plastic deformation of the Si substrate.
        Type: main
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            NameFull: Jeong, J.-h
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            NameFull: Kwon, D.
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            NameFull: Lee, W.-S.
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            – D: 01
              M: 08
              Text: August 1 2001
              Type: published
              Y: 2001
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              Value: 90
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