Ferguson, B. A., Reeves, C. T., & Safarik, D. J. (2001). Silicon deposition from disilane on Si(100)-2×1: Microscopic model including adsorption. Journal of Applied Physics, 90(10), 4981. https://doi.org/10.1063/1.1402141
Chicago Style (17th ed.) CitationFerguson, B. A., C. T. Reeves, and D. J. Safarik. "Silicon Deposition from Disilane on Si(100)-2×1: Microscopic Model Including Adsorption." Journal of Applied Physics 90, no. 10 (2001): 4981. https://doi.org/10.1063/1.1402141.
MLA (9th ed.) CitationFerguson, B. A., et al. "Silicon Deposition from Disilane on Si(100)-2×1: Microscopic Model Including Adsorption." Journal of Applied Physics, vol. 90, no. 10, 2001, p. 4981, https://doi.org/10.1063/1.1402141.
Warning: These citations may not always be 100% accurate.