Oxidation rate enhancement of SiGe epitaxial films oxidized in dry ambient.
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| Title: | Oxidation rate enhancement of SiGe epitaxial films oxidized in dry ambient. |
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| Authors: | Spadafora, M., Privitera, G., Terrasi, A. |
| Source: | Applied Physics Letters; November 3 2003, Vol. 83 Issue 18, p3713-3715, 3p |
| Database: | Applied Science & Technology Source |
| ISSN: | 00036951 |
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| DOI: | 10.1063/1.1622439 |
