Inductively coupled plasma etching of SiC in SF6/O2 and etch-induced surface chemical bonding modifications.
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| Title: | Inductively coupled plasma etching of SiC in SF6/O2 and etch-induced surface chemical bonding modifications. |
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| Authors: | Jiang, Liudi, Cheung, R., Brown, R. |
| Source: | Journal of Applied Physics; February 1 2003, Vol. 93 Issue 3, p1376-1383, 8p |
| Database: | Applied Science & Technology Source |
| ISSN: | 00218979 |
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| DOI: | 10.1063/1.1534908 |
