Inductively coupled plasma etching of SiC in SF6/O2 and etch-induced surface chemical bonding modifications.
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| Title: | Inductively coupled plasma etching of SiC in SF6/O2 and etch-induced surface chemical bonding modifications. |
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| Authors: | Jiang, Liudi, Cheung, R., Brown, R. |
| Source: | Journal of Applied Physics; February 1 2003, Vol. 93 Issue 3, p1376-1383, 8p |
| Database: | Applied Science & Technology Source |
| FullText | Text: Availability: 0 |
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| Header | DbId: aci DbLabel: Applied Science & Technology Source An: 500990463 AccessLevel: 2 PubType: Academic Journal PubTypeId: academicJournal PreciseRelevancyScore: 0 |
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| Items | – Name: Title Label: Title Group: Ti Data: Inductively coupled plasma etching of SiC in SF6/O2 and etch-induced surface chemical bonding modifications. – Name: Author Label: Authors Group: Au Data: <searchLink fieldCode="AU" term="%22Jiang%2C+Liudi%22">Jiang, Liudi</searchLink><br /><searchLink fieldCode="AU" term="%22Cheung%2C+R%2E%22">Cheung, R.</searchLink><br /><searchLink fieldCode="AU" term="%22Brown%2C+R%2E%22">Brown, R.</searchLink> – Name: TitleSource Label: Source Group: Src Data: <searchLink fieldCode="JN" term="%22Journal+of+Applied+Physics%22">Journal of Applied Physics</searchLink>; February 1 2003, Vol. 93 Issue 3, p1376-1383, 8p |
| PLink | https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=500990463 |
| RecordInfo | BibRecord: BibEntity: Identifiers: – Type: doi Value: 10.1063/1.1534908 Languages: – Code: eng Text: English PhysicalDescription: Pagination: PageCount: 8 StartPage: 1376 Titles: – TitleFull: Inductively coupled plasma etching of SiC in SF6/O2 and etch-induced surface chemical bonding modifications. Type: main BibRelationships: HasContributorRelationships: – PersonEntity: Name: NameFull: Jiang, Liudi – PersonEntity: Name: NameFull: Cheung, R. – PersonEntity: Name: NameFull: Brown, R. IsPartOfRelationships: – BibEntity: Dates: – D: 01 M: 02 Text: February 1 2003 Type: published Y: 2003 Identifiers: – Type: issn-print Value: 00218979 Numbering: – Type: volume Value: 93 – Type: issue Value: 3 Titles: – TitleFull: Journal of Applied Physics Type: main |
| ResultId | 1 |