High-selectivity etching of polycrystalline 3C-SiC films using HBr-based transformer coupled plasma.

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Bibliographic Details
Title: High-selectivity etching of polycrystalline 3C-SiC films using HBr-based transformer coupled plasma.
Authors: Gao, Di, Howe, Roger T., Maboudian, Roya
Source: Applied Physics Letters; March 17 2003, Vol. 82 Issue 11, p1742-1744, 3p
Database: Applied Science & Technology Source
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