Improved planar radio frequency inductively coupled plasma configuration in plasma immersion ion implantation.

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Bibliographic Details
Title: Improved planar radio frequency inductively coupled plasma configuration in plasma immersion ion implantation.
Authors: Tang, D. L., Fu, R. K. Y., Tian, X. B.
Source: Review of Scientific Instruments; May 2003, Vol. 74 Issue 5, p2704-2708, 5p
Database: Applied Science & Technology Source
Description
ISSN:00346748
DOI:10.1063/1.1568559