Tang, D. L., Fu, R. K. Y., & Tian, X. B. (2003). Improved planar radio frequency inductively coupled plasma configuration in plasma immersion ion implantation. Review of Scientific Instruments, 74(5), 2704. https://doi.org/10.1063/1.1568559
Chicago Style (17th ed.) CitationTang, D. L., R. K. Y. Fu, and X. B. Tian. "Improved Planar Radio Frequency Inductively Coupled Plasma Configuration in Plasma Immersion Ion Implantation." Review of Scientific Instruments 74, no. 5 (2003): 2704. https://doi.org/10.1063/1.1568559.
MLA (9th ed.) CitationTang, D. L., et al. "Improved Planar Radio Frequency Inductively Coupled Plasma Configuration in Plasma Immersion Ion Implantation." Review of Scientific Instruments, vol. 74, no. 5, 2003, p. 2704, https://doi.org/10.1063/1.1568559.