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Improved planar radio frequency inductively coupled plasma configuration in plasma immersion ion implantation.

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Bibliographic Details
Title: Improved planar radio frequency inductively coupled plasma configuration in plasma immersion ion implantation.
Authors: Tang, D. L., Fu, R. K. Y., Tian, X. B.
Source: Review of Scientific Instruments; May 2003, Vol. 74 Issue 5, p2704-2708, 5p
Database: Applied Science & Technology Source
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DbLabel: Applied Science & Technology Source
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PubType: Academic Journal
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  Data: Improved planar radio frequency inductively coupled plasma configuration in plasma immersion ion implantation.
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  Data: <searchLink fieldCode="AU" term="%22Tang%2C+D%2E+L%2E%22">Tang, D. L.</searchLink><br /><searchLink fieldCode="AU" term="%22Fu%2C+R%2E+K%2E+Y%2E%22">Fu, R. K. Y.</searchLink><br /><searchLink fieldCode="AU" term="%22Tian%2C+X%2E+B%2E%22">Tian, X. B.</searchLink>
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  Data: <searchLink fieldCode="JN" term="%22Review+of+Scientific+Instruments%22">Review of Scientific Instruments</searchLink>; May 2003, Vol. 74 Issue 5, p2704-2708, 5p
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      – Type: doi
        Value: 10.1063/1.1568559
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      – Code: eng
        Text: English
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        PageCount: 5
        StartPage: 2704
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      – TitleFull: Improved planar radio frequency inductively coupled plasma configuration in plasma immersion ion implantation.
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            NameFull: Tang, D. L.
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            NameFull: Fu, R. K. Y.
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            NameFull: Tian, X. B.
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            – D: 01
              M: 05
              Text: May 2003
              Type: published
              Y: 2003
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              Value: 74
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