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Uniformity across 200 mm silicon wafers printed by nanoimprint lithography.

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Bibliographic Details
Title:	Uniformity across 200 mm silicon wafers printed by nanoimprint lithography.
Authors:	Gourgon, C., Perret, C., Tallal, J.
Source:	Journal of Physics: D Applied Physics; January 7 2005, Vol. 38 Issue 1, p70-73, 4p
Database:	Applied Science & Technology Source

Description
ISSN:	00223727
DOI:	10.1088/0022-3727/38/1/012