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Uniformity across 200 mm silicon wafers printed by nanoimprint lithography.

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Bibliographic Details
Title: Uniformity across 200 mm silicon wafers printed by nanoimprint lithography.
Authors: Gourgon, C., Perret, C., Tallal, J.
Source: Journal of Physics: D Applied Physics; January 7 2005, Vol. 38 Issue 1, p70-73, 4p
Database: Applied Science & Technology Source
FullText Text:
  Availability: 0
Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 501085945
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
IllustrationInfo
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  Data: Uniformity across 200 mm silicon wafers printed by nanoimprint lithography.
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  Data: <searchLink fieldCode="AU" term="%22Gourgon%2C+C%2E%22">Gourgon, C.</searchLink><br /><searchLink fieldCode="AU" term="%22Perret%2C+C%2E%22">Perret, C.</searchLink><br /><searchLink fieldCode="AU" term="%22Tallal%2C+J%2E%22">Tallal, J.</searchLink>
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+Physics%3A+D+Applied+Physics%22">Journal of Physics: D Applied Physics</searchLink>; January 7 2005, Vol. 38 Issue 1, p70-73, 4p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=501085945
RecordInfo BibRecord:
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      – Type: doi
        Value: 10.1088/0022-3727/38/1/012
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      – Code: eng
        Text: English
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        PageCount: 4
        StartPage: 70
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      – TitleFull: Uniformity across 200 mm silicon wafers printed by nanoimprint lithography.
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            NameFull: Gourgon, C.
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            NameFull: Perret, C.
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            NameFull: Tallal, J.
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            – D: 07
              M: 01
              Text: January 7 2005
              Type: published
              Y: 2005
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              Value: 38
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            – TitleFull: Journal of Physics: D Applied Physics
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