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Effect of a mid-temperature thermal annealing on the enhancement of boron diffusion during rapid thermal annealing.

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Bibliographic Details
Title: Effect of a mid-temperature thermal annealing on the enhancement of boron diffusion during rapid thermal annealing.
Authors: Lévêque, P., Mathiot, D., Christensen, J. S.
Source: Journal of Applied Physics; April 1 2006, Vol. 99 Issue 7, p073506-073506, 1p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 501240468
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Effect of a mid-temperature thermal annealing on the enhancement of boron diffusion during rapid thermal annealing.
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  Data: <searchLink fieldCode="AU" term="%22Lévêque%2C+P%2E%22">Lévêque, P.</searchLink><br /><searchLink fieldCode="AU" term="%22Mathiot%2C+D%2E%22">Mathiot, D.</searchLink><br /><searchLink fieldCode="AU" term="%22Christensen%2C+J%2E+S%2E%22">Christensen, J. S.</searchLink>
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+Applied+Physics%22">Journal of Applied Physics</searchLink>; April 1 2006, Vol. 99 Issue 7, p073506-073506, 1p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=501240468
RecordInfo BibRecord:
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      – Type: doi
        Value: 10.1063/1.2183583
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      – Code: eng
        Text: English
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        PageCount: 1
        StartPage: 073506
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      – TitleFull: Effect of a mid-temperature thermal annealing on the enhancement of boron diffusion during rapid thermal annealing.
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            NameFull: Lévêque, P.
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            NameFull: Mathiot, D.
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            NameFull: Christensen, J. S.
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            – D: 01
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              Text: April 1 2006
              Type: published
              Y: 2006
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              Value: 99
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              Value: 7
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