Room-Temperature Wet Etching of Polycrystalline and Nanocrystalline Silicon Carbide Thin Films with HF and HNO3.
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| Title: | Room-Temperature Wet Etching of Polycrystalline and Nanocrystalline Silicon Carbide Thin Films with HF and HNO3. |
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| Authors: | Roper, Christopher S., Howe, Roger T., Maboudian, Roya |
| Source: | Journal of the Electrochemical Society; 2009, Vol. 156 Issue 3, pD104-D107, 4p |
| Database: | Applied Science & Technology Source |
| ISSN: | 00134651 |
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| DOI: | 10.1149/1.3061944 |
