Scalability and Reliability Characteristics of CVD HfO2 Gate Dielectrics with HfN Electrodes for Advanced CMOS Applications.
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| Title: | Scalability and Reliability Characteristics of CVD HfO2 Gate Dielectrics with HfN Electrodes for Advanced CMOS Applications. |
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| Authors: | Kang, J. F., Yu, H. Y., Ren, C. |
| Source: | Journal of the Electrochemical Society; Nov2007, Vol. 154 Issue 11, pH927-H932, 6p |
| Database: | Applied Science & Technology Source |
| ISSN: | 00134651 |
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| DOI: | 10.1149/1.2775163 |
