Modeling of Inversion Layer Centroid and Polysilicon Depletion Effects on Ultrathin-Gate-Oxide MOSFET Behavior: The Influence of Crystallographic Orientation.

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Bibliographic Details
Title: Modeling of Inversion Layer Centroid and Polysilicon Depletion Effects on Ultrathin-Gate-Oxide MOSFET Behavior: The Influence of Crystallographic Orientation.
Authors: Rodriguez, Noel, Gámiz, Francisco, Roldán, Juan B.
Source: IEEE Transactions on Electron Devices; April 2007, Vol. 54 Issue 4, p723-732, 10p
Database: Applied Science & Technology Source
Description
ISSN:00189383
DOI:10.1109/TED.2007.891854