Very Low Pressure Magnetron Reactive Ion Etching of GaN and AlxGa1-xN Using Dichlorofluoromethane (Halocarbon 12)
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| Title: | Very Low Pressure Magnetron Reactive Ion Etching of GaN and AlxGa1-xN Using Dichlorofluoromethane (Halocarbon 12) |
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| Authors: | Batoni, P., Patel, K., Burkhart, C. C. |
| Source: | Journal of Electronic Materials; September 2007, Vol. 36 Issue 9, p1166-1173, 8p |
| Database: | Applied Science & Technology Source |
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