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Charge storage characteristics of high density Mo nanocrystal embedded in silicon oxide and silicon nitride.

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Title: Charge storage characteristics of high density Mo nanocrystal embedded in silicon oxide and silicon nitride.
Authors: Lin, Chao-Cheng, Chang, Ting-Chang, Tu, Chun-Hao
Source: Journal of Physics: D Applied Physics; February 24 2010, Vol. 43 Issue 7, p075106-1-075106-4, 4p
Database: Applied Science & Technology Source
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  Availability: 0
Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 501557174
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Charge storage characteristics of high density Mo nanocrystal embedded in silicon oxide and silicon nitride.
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  Data: <searchLink fieldCode="AU" term="%22Lin%2C+Chao-Cheng%22">Lin, Chao-Cheng</searchLink><br /><searchLink fieldCode="AU" term="%22Chang%2C+Ting-Chang%22">Chang, Ting-Chang</searchLink><br /><searchLink fieldCode="AU" term="%22Tu%2C+Chun-Hao%22">Tu, Chun-Hao</searchLink>
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+Physics%3A+D+Applied+Physics%22">Journal of Physics: D Applied Physics</searchLink>; February 24 2010, Vol. 43 Issue 7, p075106-1-075106-4, 4p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=501557174
RecordInfo BibRecord:
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    Identifiers:
      – Type: doi
        Value: 10.1088/0022-3727/43/7/075106
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      – Code: eng
        Text: English
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        PageCount: 4
        StartPage: 075106-1
    Titles:
      – TitleFull: Charge storage characteristics of high density Mo nanocrystal embedded in silicon oxide and silicon nitride.
        Type: main
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          Name:
            NameFull: Lin, Chao-Cheng
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            NameFull: Chang, Ting-Chang
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            NameFull: Tu, Chun-Hao
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            – D: 24
              M: 02
              Text: February 24 2010
              Type: published
              Y: 2010
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              Value: 43
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              Value: 7
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            – TitleFull: Journal of Physics: D Applied Physics
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