Study of molecular-beam epitaxially grown GexSi1-x/Si layers by Raman scattering.

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Bibliographic Details
Title: Study of molecular-beam epitaxially grown GexSi1-x/Si layers by Raman scattering.
Authors: Chang, S. J., Kallel, M. A., Wang, K. L.
Source: Journal of Applied Physics; October 1 1988, Vol. 64, p3634-3636, 3p
Database: Applied Science & Technology Source
Description
ISSN:00218979
DOI:10.1063/1.341401