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Damage to the silicon lattice by reactive ion etching.

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Bibliographic Details
Title: Damage to the silicon lattice by reactive ion etching.
Authors: Strunk, H. P., Cerva, H., Mohr, E. G.
Source: Journal of the Electrochemical Society; November 1988, Vol. 135, p2876-2880, 5p
Database: Applied Science & Technology Source
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  Availability: 0
Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 501594130
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
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  Data: Damage to the silicon lattice by reactive ion etching.
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        Value: 10.1149/1.2095452
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      – Code: eng
        Text: English
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        PageCount: 5
        StartPage: 2876
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      – TitleFull: Damage to the silicon lattice by reactive ion etching.
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            NameFull: Strunk, H. P.
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            NameFull: Cerva, H.
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            NameFull: Mohr, E. G.
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              Text: November 1988
              Type: published
              Y: 1988
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              Value: 135
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