Damage to the silicon lattice by reactive ion etching.
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| Title: | Damage to the silicon lattice by reactive ion etching. |
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| Authors: | Strunk, H. P., Cerva, H., Mohr, E. G. |
| Source: | Journal of the Electrochemical Society; November 1988, Vol. 135, p2876-2880, 5p |
| Database: | Applied Science & Technology Source |
| ISSN: | 00134651 |
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| DOI: | 10.1149/1.2095452 |
