O3-based atomic layer deposition of hexagonal La2O3 films on Si(100) and Ge(100) substrates.
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| Title: | O3-based atomic layer deposition of hexagonal La2O3 films on Si(100) and Ge(100) substrates. |
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| Authors: | Lamagna, L., Wiemer, C., Perego, M. |
| Source: | Journal of Applied Physics; Oct2010, Vol. 108 Issue 4, p084108-1-084108-11, 11p |
| Database: | Applied Science & Technology Source |
| ISSN: | 00218979 |
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| DOI: | 10.1063/1.3499258 |
