Mathiot, D., & Hocine, S. (1989). Titanium-related deep levels in silicon: A reexamination. Journal of Applied Physics, 66, 5862. https://doi.org/10.1063/1.343608
Chicago Style (17th ed.) CitationMathiot, D., and S. Hocine. "Titanium-related Deep Levels in Silicon: A Reexamination." Journal of Applied Physics 66 (1989): 5862. https://doi.org/10.1063/1.343608.
MLA (9th ed.) CitationMathiot, D., and S. Hocine. "Titanium-related Deep Levels in Silicon: A Reexamination." Journal of Applied Physics, vol. 66, 1989, p. 5862, https://doi.org/10.1063/1.343608.
Warning: These citations may not always be 100% accurate.