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Titanium-related deep levels in silicon: a reexamination.

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Bibliographic Details
Title: Titanium-related deep levels in silicon: a reexamination.
Authors: Mathiot, D., Hocine, S.
Source: Journal of Applied Physics; December 15 1989, Vol. 66, p5862-5867, 6p
Database: Applied Science & Technology Source
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DbLabel: Applied Science & Technology Source
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PubType: Academic Journal
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  Data: Titanium-related deep levels in silicon: a reexamination.
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        Value: 10.1063/1.343608
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      – Code: eng
        Text: English
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        PageCount: 6
        StartPage: 5862
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      – TitleFull: Titanium-related deep levels in silicon: a reexamination.
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            NameFull: Mathiot, D.
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            NameFull: Hocine, S.
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              Text: December 15 1989
              Type: published
              Y: 1989
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              Value: 66
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            – TitleFull: Journal of Applied Physics
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