Numerical simulation of temperature distributions during electron beam annealing of multilayer semiconductor structures.

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Bibliographic Details
Title: Numerical simulation of temperature distributions during electron beam annealing of multilayer semiconductor structures.
Authors: Meglicki, Z., Sumich, R. J., Faraone, L.
Source: Journal of Applied Physics; June 1 1990, Vol. 67, p7050-7058, 9p
Database: Applied Science & Technology Source
Description
ISSN:00218979
DOI:10.1063/1.345053