Meglicki, Z., Sumich, R. J., & Faraone, L. (1990). Numerical simulation of temperature distributions during electron beam annealing of multilayer semiconductor structures. Journal of Applied Physics, 67, 7050. https://doi.org/10.1063/1.345053
Chicago Style (17th ed.) CitationMeglicki, Z., R. J. Sumich, and L. Faraone. "Numerical Simulation of Temperature Distributions During Electron Beam Annealing of Multilayer Semiconductor Structures." Journal of Applied Physics 67 (1990): 7050. https://doi.org/10.1063/1.345053.
MLA (9th ed.) CitationMeglicki, Z., et al. "Numerical Simulation of Temperature Distributions During Electron Beam Annealing of Multilayer Semiconductor Structures." Journal of Applied Physics, vol. 67, 1990, p. 7050, https://doi.org/10.1063/1.345053.