Low-temperature in situ surface cleaning of oxide-patterned wafers by Ar/H2 plasma sputter.
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| Title: | Low-temperature in situ surface cleaning of oxide-patterned wafers by Ar/H2 plasma sputter. |
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| Authors: | Yew, Tri-Rung, Reif, Rafael |
| Source: | Journal of Applied Physics; November 1 1990, Vol. 68, p4681-4693, 13p |
| Database: | Applied Science & Technology Source |
| ISSN: | 00218979 |
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| DOI: | 10.1063/1.346180 |
