APA (7th ed.) Citation

Yew, T., & Reif, R. (1990). Low-temperature in situ surface cleaning of oxide-patterned wafers by Ar/H2 plasma sputter. Journal of Applied Physics, 68, 4681. https://doi.org/10.1063/1.346180

Chicago Style (17th ed.) Citation

Yew, Tri-Rung, and Rafael Reif. "Low-temperature in Situ Surface Cleaning of Oxide-patterned Wafers by Ar/H2 Plasma Sputter." Journal of Applied Physics 68 (1990): 4681. https://doi.org/10.1063/1.346180.

MLA (9th ed.) Citation

Yew, Tri-Rung, and Rafael Reif. "Low-temperature in Situ Surface Cleaning of Oxide-patterned Wafers by Ar/H2 Plasma Sputter." Journal of Applied Physics, vol. 68, 1990, p. 4681, https://doi.org/10.1063/1.346180.