Diffusion of boron in silicon during post-implantation annealing.
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| Title: | Diffusion of boron in silicon during post-implantation annealing. |
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| Authors: | Solmi, S., Baruffaldi, F. |
| Source: | Journal of Applied Physics; February 15 1991, Vol. 69, p2135-2142, 8p |
| Database: | Applied Science & Technology Source |
| ISSN: | 00218979 |
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| DOI: | 10.1063/1.348740 |
