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Properties of the fluorine-implanted Si-SiO2 system.

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Bibliographic Details
Title:	Properties of the fluorine-implanted Si-SiO2 system.
Authors:	Virdi, G. S., Rauthan, C. M. S., Pathak, B. C.
Source:	Solid-State Electronics; August 1991, Vol. 34, p889-892, 4p
Database:	Applied Science & Technology Source

Description
ISSN:	00381101
DOI:	10.1016/0038-1101(91)90236-R