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Properties of the fluorine-implanted Si-SiO2 system.

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Bibliographic Details
Title: Properties of the fluorine-implanted Si-SiO2 system.
Authors: Virdi, G. S., Rauthan, C. M. S., Pathak, B. C.
Source: Solid-State Electronics; August 1991, Vol. 34, p889-892, 4p
Database: Applied Science & Technology Source
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