Effect of ion bombardment on the plasma-assisted etching and deposition of plasma perfluoropolymer thin films.
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| Title: | Effect of ion bombardment on the plasma-assisted etching and deposition of plasma perfluoropolymer thin films. |
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| Authors: | Fracassi, F., Occhiello, E., Coburn, J. W., 1932- |
| Source: | Journal of Applied Physics; November 1 1987, Vol. 62, p3980-3981, 2p |
| Database: | Applied Science & Technology Source |
| ISSN: | 00218979 |
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| DOI: | 10.1063/1.339197 |
