An optimized in situ argon sputter cleaning process for device quality low-temperature (T≤800°C) epitaxial silicon: bipolar transistor and pn junction characterization.
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| Title: | An optimized in situ argon sputter cleaning process for device quality low-temperature (T≤800°C) epitaxial silicon: bipolar transistor and pn junction characterization. |
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| Authors: | Burger, W. R., Reif, R. |
| Source: | Journal of Applied Physics; November 15 1987, Vol. 62, p4255-4268, 14p |
| Database: | Applied Science & Technology Source |
| ISSN: | 00218979 |
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| DOI: | 10.1063/1.339099 |
