Plasma-assisted etching of tungsten films: a quartz-crystal microbalance study.
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| Title: | Plasma-assisted etching of tungsten films: a quartz-crystal microbalance study. |
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| Authors: | Fracassi, F., Coburn, J. W., 1932- |
| Source: | Journal of Applied Physics; March 1 1988, Vol. 63, p1758-1761, 4p |
| Database: | Applied Science & Technology Source |
| ISSN: | 00218979 |
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| DOI: | 10.1063/1.339915 |
