Fracassi, F., & Coburn, J. W. (1988). Plasma-assisted etching of tungsten films: A quartz-crystal microbalance study. Journal of Applied Physics, 63, 1758. https://doi.org/10.1063/1.339915
Chicago Style (17th ed.) CitationFracassi, F., and J. W. Coburn. "Plasma-assisted Etching of Tungsten Films: A Quartz-crystal Microbalance Study." Journal of Applied Physics 63 (1988): 1758. https://doi.org/10.1063/1.339915.
MLA (9th ed.) CitationFracassi, F., and J. W. Coburn. "Plasma-assisted Etching of Tungsten Films: A Quartz-crystal Microbalance Study." Journal of Applied Physics, vol. 63, 1988, p. 1758, https://doi.org/10.1063/1.339915.
Warning: These citations may not always be 100% accurate.