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Plasma-assisted etching of tungsten films: a quartz-crystal microbalance study.

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Bibliographic Details
Title: Plasma-assisted etching of tungsten films: a quartz-crystal microbalance study.
Authors: Fracassi, F., Coburn, J. W., 1932-
Source: Journal of Applied Physics; March 1 1988, Vol. 63, p1758-1761, 4p
Database: Applied Science & Technology Source
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Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 501969424
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Plasma-assisted etching of tungsten films: a quartz-crystal microbalance study.
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  Data: <searchLink fieldCode="AU" term="%22Fracassi%2C+F%2E%22">Fracassi, F.</searchLink><br /><searchLink fieldCode="AU" term="%22Coburn%2C+J%2E+W%2E%2C+1932-%22">Coburn, J. W., 1932-</searchLink>
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+Applied+Physics%22">Journal of Applied Physics</searchLink>; March 1 1988, Vol. 63, p1758-1761, 4p
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      – Type: doi
        Value: 10.1063/1.339915
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      – Code: eng
        Text: English
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        PageCount: 4
        StartPage: 1758
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      – TitleFull: Plasma-assisted etching of tungsten films: a quartz-crystal microbalance study.
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            NameFull: Fracassi, F.
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            NameFull: Coburn, J. W.
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              Text: March 1 1988
              Type: published
              Y: 1988
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              Value: 63
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            – TitleFull: Journal of Applied Physics
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