Reverse annealing and low-temperature diffusion of boron in boron-implanted silicon.
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| Title: | Reverse annealing and low-temperature diffusion of boron in boron-implanted silicon. |
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| Authors: | Huang, J., Fan, D., Jaccodine, R. J. |
| Source: | Journal of Applied Physics; June 1 1988, Vol. 63, p5521-5525, 5p |
| Database: | Applied Science & Technology Source |
| ISSN: | 00218979 |
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| DOI: | 10.1063/1.340328 |
