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Simulation of the step coverage for chemical vapor deposited silicon dioxide.

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Bibliographic Details
Title: Simulation of the step coverage for chemical vapor deposited silicon dioxide.
Authors: Wille, H., Burte, E., Ryssel, H.
Source: Journal of Applied Physics; April 1 1992, Vol. 71, p3532-3537, 6p
Database: Applied Science & Technology Source
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