APA (7th ed.) Citation

Dehm, C., Burte, E. P., & Gyulai, J. (1992). The influence of ion beam mixed TiSi2 layers on reverse characteristics of diodes. Journal of Applied Physics, 71, 4365. https://doi.org/10.1063/1.350796

Chicago Style (17th ed.) Citation

Dehm, C., E. P. Burte, and J. Gyulai. "The Influence of Ion Beam Mixed TiSi2 Layers on Reverse Characteristics of Diodes." Journal of Applied Physics 71 (1992): 4365. https://doi.org/10.1063/1.350796.

MLA (9th ed.) Citation

Dehm, C., et al. "The Influence of Ion Beam Mixed TiSi2 Layers on Reverse Characteristics of Diodes." Journal of Applied Physics, vol. 71, 1992, p. 4365, https://doi.org/10.1063/1.350796.