Etching of tungsten and tungsten silicide films by chlorine atoms.
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| Title: | Etching of tungsten and tungsten silicide films by chlorine atoms. |
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| Authors: | Fischl, D. S., Rodrigues, G. W., Hess, D. W. |
| Source: | Journal of the Electrochemical Society; August 1988, Vol. 135, p2016-2019, 4p |
| Database: | Applied Science & Technology Source |
| ISSN: | 00134651 |
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| DOI: | 10.1149/1.2097848 |
