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Etching of tungsten and tungsten silicide films by chlorine atoms.

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Bibliographic Details
Title: Etching of tungsten and tungsten silicide films by chlorine atoms.
Authors: Fischl, D. S., Rodrigues, G. W., Hess, D. W.
Source: Journal of the Electrochemical Society; August 1988, Vol. 135, p2016-2019, 4p
Database: Applied Science & Technology Source
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  Availability: 0
Header DbId: aci
DbLabel: Applied Science & Technology Source
An: 502016929
AccessLevel: 2
PubType: Academic Journal
PubTypeId: academicJournal
PreciseRelevancyScore: 0
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  Data: Etching of tungsten and tungsten silicide films by chlorine atoms.
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  Data: <searchLink fieldCode="AU" term="%22Fischl%2C+D%2E+S%2E%22">Fischl, D. S.</searchLink><br /><searchLink fieldCode="AU" term="%22Rodrigues%2C+G%2E+W%2E%22">Rodrigues, G. W.</searchLink><br /><searchLink fieldCode="AU" term="%22Hess%2C+D%2E+W%2E%22">Hess, D. W.</searchLink>
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  Data: <searchLink fieldCode="JN" term="%22Journal+of+the+Electrochemical+Society%22">Journal of the Electrochemical Society</searchLink>; August 1988, Vol. 135, p2016-2019, 4p
PLink https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&db=aci&AN=502016929
RecordInfo BibRecord:
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    Identifiers:
      – Type: doi
        Value: 10.1149/1.2097848
    Languages:
      – Code: eng
        Text: English
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      Pagination:
        PageCount: 4
        StartPage: 2016
    Titles:
      – TitleFull: Etching of tungsten and tungsten silicide films by chlorine atoms.
        Type: main
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      – PersonEntity:
          Name:
            NameFull: Fischl, D. S.
      – PersonEntity:
          Name:
            NameFull: Rodrigues, G. W.
      – PersonEntity:
          Name:
            NameFull: Hess, D. W.
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          Dates:
            – D: 01
              M: 08
              Text: August 1988
              Type: published
              Y: 1988
          Identifiers:
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              Value: 00134651
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            – Type: volume
              Value: 135
          Titles:
            – TitleFull: Journal of the Electrochemical Society
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