Physical modeling and implementation scheme of native defect diffusion and interdiffusion in SiGe heterostructures for atomistic process simulation.
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| Title: | Physical modeling and implementation scheme of native defect diffusion and interdiffusion in SiGe heterostructures for atomistic process simulation. |
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| Authors: | Castrillo, P., Pinacho, R., Jaraiz, M. |
| Source: | Journal of Applied Physics; May 15 2011, Vol. 109 Issue 10, p103502-1-103502-13, 13p |
| Database: | Applied Science & Technology Source |
| ISSN: | 00218979 |
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| DOI: | 10.1063/1.3581113 |
