Al-Doped Zinc Oxide Film Deposition in Function of Power by AC Bipolar Pulse in Reactive Magnetron Sputtering.

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Title: Al-Doped Zinc Oxide Film Deposition in Function of Power by AC Bipolar Pulse in Reactive Magnetron Sputtering.
Authors: Garcia-Garcia, J., Pacheco-Sotelo, J., Valdivia-Barrientos, R., Rivera-Rodriguez, C., Pacheco-Pacheco, M., Gonzalez, Jean-Jacques, Soria-Arguello, G., Nieto-Perez, M.
Source: IEEE Transactions on Plasma Science; Nov2011 Part 3 Part 3, Vol. 39 Issue 11, p2484-2485, 2p
Database: Applied Science & Technology Source
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DbLabel: Applied Science & Technology Source
An: 527658039
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PubType: Academic Journal
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  Data: Al-Doped Zinc Oxide Film Deposition in Function of Power by AC Bipolar Pulse in Reactive Magnetron Sputtering.
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        Value: 10.1109/TPS.2011.2160368
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        Text: English
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      – TitleFull: Al-Doped Zinc Oxide Film Deposition in Function of Power by AC Bipolar Pulse in Reactive Magnetron Sputtering.
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            NameFull: Garcia-Garcia, J.
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            NameFull: Pacheco-Sotelo, J.
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            NameFull: Valdivia-Barrientos, R.
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            NameFull: Rivera-Rodriguez, C.
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            NameFull: Gonzalez, Jean-Jacques
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              Text: Nov2011 Part 3 Part 3
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              Y: 2011
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