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Self-Aligned Double Patterning Decomposition for Overlay Minimization and Hot Spot Detection.

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Bibliographic Details
Title: Self-Aligned Double Patterning Decomposition for Overlay Minimization and Hot Spot Detection.
Source: DAC: Annual ACM/IEEE Design Automation Conference; Jun2011, p71-76, 6p, 9 Diagrams, 1 Chart, 1 Graph
Database: Applied Science & Technology Source
Description
ISSN:0738100X