(2011). Self-Aligned Double Patterning Decomposition for Overlay Minimization and Hot Spot Detection. DAC: Annual ACM/IEEE Design Automation Conference, 71.
Chicago Style (17th ed.) Citation"Self-Aligned Double Patterning Decomposition for Overlay Minimization and Hot Spot Detection." DAC: Annual ACM/IEEE Design Automation Conference 2011: 71.
MLA (9th ed.) Citation"Self-Aligned Double Patterning Decomposition for Overlay Minimization and Hot Spot Detection." DAC: Annual ACM/IEEE Design Automation Conference, 2011, p. 71.
Warning: These citations may not always be 100% accurate.
