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Self-Aligned Double Patterning Decomposition for Overlay Minimization and Hot Spot Detection.

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Title: Self-Aligned Double Patterning Decomposition for Overlay Minimization and Hot Spot Detection.
Source: DAC: Annual ACM/IEEE Design Automation Conference; Jun2011, p71-76, 6p, 9 Diagrams, 1 Chart, 1 Graph
Database: Applied Science & Technology Source
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DbLabel: Applied Science & Technology Source
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PubType: Conference
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  Data: Self-Aligned Double Patterning Decomposition for Overlay Minimization and Hot Spot Detection.
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      – Code: eng
        Text: English
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        PageCount: 6
        StartPage: 71
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      – TitleFull: Self-Aligned Double Patterning Decomposition for Overlay Minimization and Hot Spot Detection.
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            – D: 01
              M: 06
              Text: Jun2011
              Type: published
              Y: 2011
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            – TitleFull: DAC: Annual ACM/IEEE Design Automation Conference
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