Improvement in performance and reliability with CF4 plasma pretreatment on the buffer oxide layer for low-temperature polysilicon thin-film transistor.

Saved in:
Bibliographic Details
Title: Improvement in performance and reliability with CF4 plasma pretreatment on the buffer oxide layer for low-temperature polysilicon thin-film transistor.
Authors: Ching-Lin Fan1,2, clfan@mail.ntust.edu.tw, Yi-Yan Lin1, Chun-Chieh Yang1
Source: Semiconductor Science & Technology; Mar2012, Vol. 27 Issue 3, p035005-035005, 1p, 1 Diagram, 2 Charts, 6 Graphs
Database: Applied Science & Technology Source
Description
ISSN:02681242
DOI:10.1088/0268-1242/27/3/035005